SIMS analysis of HfSiO(N) thin films

Applied Surface Science

Volumn 252, Issue 19, 2006, Pages 7176-7178

  Miwa, Shiro ^a   Kusanagi, Susumu ^a   Kobayashi, Hajime ^a  

^a SONY CORPORATION   (Japan)

Author keywords

Backside SIMS; HfSiO; N profile

Indexed keywords

DIFFUSION; HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); ION BEAMS; SECONDARY ION MASS SPECTROMETRY; SURFACE PHENOMENA;

BACKSIDE-SIMS; GLANCING ANGLE; HFSIO; N PROFILE;

THIN FILMS;

EID: 33747179883     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.02.093     Document Type: Article

References (3)

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