Recovery of fused silica surface damage resistance by ion beam etching

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 15, 2008, Pages 3370-3374

  Xu, Shizhen ^a   Zheng, Wanguo ^b   Yuan, Xiaodong ^b   Lv, Haibin ^b   Zu, Xiaotao ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

Ion beam etching; Laser induced damage threshold; Surface roughness; UV laser

Indexed keywords

ATOMIC FORCE MICROSCOPY; BEAM PLASMA INTERACTIONS; ETCHING; HEALTH; ION BEAMS; ION BOMBARDMENT; IONS; LASER DAMAGE; LASERS; LIGHT EMISSION; LUMINESCENCE; MICROSCOPIC EXAMINATION; OPTICAL MICROSCOPY; PARAMETER ESTIMATION; PHOTOLUMINESCENCE; PULSED LASER DEPOSITION; RECOVERY; SCANNING PROBE MICROSCOPY; SILICA; SILICATE MINERALS; SILICON COMPOUNDS; SULFATE MINERALS; SURFACE DEFECTS; VACUUM;

(1 1 0) SURFACE; ATOMIC FORCE (AF); DAMAGE RESISTANCE; DEFECT POPULATION; ELSEVIER (CO); ETCHING DEPTH; EVOLUTION (CO); IN-VACUUM; ION BEAM ETCHING (IBE); IRRADIATED SAMPLES; IRRADIATED SURFACES; LASER INDUCED DAMAGE THRESHOLD (LIDT); LASER IRRADIATIONS; LASER-INDUCED DEFECTS; MICRO-ROUGHNESS; OPTICAL INTERFEROMETRIC TECHNIQUE; ROOT MEAN SQUARE (R.M.S.); SILICA SURFACES; SURFACE LAYERING;

FUSED SILICA;

EID: 48049100755     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.04.014     Document Type: Article

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