Morphological study of magnetron sputtered Ti thin films on silicon substrate

Materials Chemistry and Physics

Volumn 111, Issue 2-3, 2008, Pages 414-418

  Chawla, Vipin ^a,b   Jayaganthan, R ^a   Chawla, A K ^b   Chandra, Ramesh ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY ROORKEE   (India)

^b Centre of Nanotechnology   (India)

Author keywords

Grain growth; Magnetron sputtering; Microstructural characterization; Ti thin films

Indexed keywords

AGRICULTURAL PRODUCTS; ARGON; ATMOSPHERIC TEMPERATURE; ATOMIC FORCE MICROSCOPY; CRYSTALLITE SIZE; FIELD EMISSION; LITHOGRAPHY; MAGNETRON SPUTTERING; MAGNETRONS; MICROSCOPIC EXAMINATION; MORPHOLOGY; SCANNING PROBE MICROSCOPY; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THICK FILMS; THREE DIMENSIONAL; TITANIUM; X RAY DIFFRACTION ANALYSIS; X RAY FILMS;

(1 1 1) ORIENTATION; ATOMIC FORCE MICROSCOPY (AFM); AVERAGE SURFACE ROUGHNESS; BACK SCATTERED; DC-MAGNETRON SPUTTERING; ELSEVIER (CO); GRAIN SIZES; HEXAGONAL STRUCTURES; MICRO STRUCTURAL; MORPHOLOGICAL STUDY; SEM ANALYSIS; SI(1 0 0 ); SILICON (111) SUBSTRATES; SUBSTRATE TEMPERATURE (ST); THREE DIMENSIONAL (3D); TI THIN FILMS; TITANIUM FILMS; X RAY DIFFRACTION (XRD);

SUBSTRATES;

EID: 47949133686     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2008.04.048     Document Type: Article

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