Investigation of long throw PVD of titanium films from polycrystalline targets with texture

Microelectronic Engineering

Volumn 63, Issue 4, 2002, Pages 329-345

  Wolf, H ^a   Streiter, R ^b   Tirschler, W ^c   Giegengack, H ^b   Urbansky, N ^d   Gessner, T ^a,b  

^a FRAUNHOFER IZM   (Germany)

^b CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^c DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^d INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

Long throw sputtering; Physical vapor deposition; Simulation; Target texture

Indexed keywords

BACKSCATTERING; COMPUTER SIMULATION; ELECTRON DIFFRACTION; MONTE CARLO METHODS; PHYSICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; SPUTTERING; TEXTURES; TITANIUM; X RAY DIFFRACTION ANALYSIS;

LONG THROW SPUTTERING;

THIN FILMS;

EID: 0036723027     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00548-8     Document Type: Article

References (21)

1. Sputtering by particle bombardment I: Physical sputtering of single element solids
2. Sputtering by particle bombardment III: Characteristics of sputtered particles, technical applications