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15th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2007

Volumn , Issue , 2007, Pages 321-326

First quantitative observation of local temperature fluctuation in millisecond annealing

(6) Kubo, T a Sukegawa, T a Takii, E a Yamamoto, T a Satoh, S a Kase, M a

a FUJITSU LABORATORIES LTD (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CLARIFICATION; CRYSTALS; ELECTRIC CONDUCTIVITY; ELECTROMAGNETIC WAVE EMISSION; INTERNET PROTOCOLS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR MATERIALS; TRANSISTORS;

FLASH LAMPS; LOCAL TEMPERATURES; MILLISECOND ANNEALING; SHALLOW TRENCH ISOLATIONS; TEMPERATURE VARIATIONS; TRANSISTOR STRUCTURES; TRENCH DEPTHS; TRENCH STRUCTURES;

RAPID THERMAL ANNEALING;

EID: 47949116499 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/RTP.2007.4383861 Document Type: Conference Paper

Times cited : (17)

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