Minimizing pattern dependency in millisecond annealing

Extended Abstracts of the Sixth International Workshop on Junction Technology, IWJT '06

Volumn , Issue , 2006, Pages 25-30

  Feng, Lucia M ^a   Wang, Yun ^a   Markle, David A ^a  

^a Ultratech Stepper Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; LIGHT POLARIZATION; RADIATION EFFECTS; THERMAL DIFFUSION; THERMAL EFFECTS; WAVELENGTH;

ANNEALING TEMPERATURES; MILLISECOND ANNEALING; PATTERN DENSITY DIFFERENCES; ULTRA SHALLOW JUNCTIONS;

SEMICONDUCTOR JUNCTIONS;

EID: 34250212529     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/iwjt.2006.220853     Document Type: Conference Paper

References (12)

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