Temperature diagnostics for a dual-arc FRTP tool

10th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2002

Volumn , Issue , 2002, Pages 77-85

  Stuart, G C ^a   Camm, D M ^a   Cibere, J ^a   Kaludjercic, L ^a   Kervin, S L ^a   Lu, B ^a   McDonnell, K J ^a   Tam, N ^a  

^a Vortek Industries Ltd   (Canada)

Author keywords

emissometer; flash assist; infrared; radiometer

Indexed keywords

CAMERAS; HEAT TREATMENT; INFRARED DEVICES; INFRARED RADIATION; RADIOMETERS; TEMPERATURE MEASUREMENT;

EFFECTIVE RESOLUTIONS; EMISSOMETER; FLASH-ASSIST; INTERMEDIATE TEMPERATURES; NEAR INFRARED CAMERAS; TEMPERATURE COMPENSATED; TEMPERATURE DIAGNOSTICS; TEMPERATURE MEASUREMENT SYSTEMS;

SILICON WAFERS;

EID: 33745302261     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RTP.2002.1039443     Document Type: Conference Paper

References (5)

1. Intl. Tech. Roadmap for Semiconductors, 2001
2. J.Gelpey et al., "Advanced annealing for sub-130nm junction formation", presented at Electrochemical Society 2002 Spring Meeting, Philiadelphia, March 2002
3. J. Ross et al., "Characterizing implant behaviour during flash RTP by means of backside diagnostics", Proc. 10th. Intl. RTP Conference, 2002
4. T.Gebel et al., "Flash lamp annealing with millisecond pulses for ultra-shallow boron profiles in silicon", Nucl. Instrum. Meth. B, vol.186, p.287, 2002
5. D.M. Camm et al., "2D real time temperature measurements in a short wavelength arc lamp RTP chamber for improved uniformity", Proc. 3rd. Intl. RTP Conference, p. 241, 1995