Structural and optical properties of nanocrystalline ZnO thin films synthesized by the citrate precursor route

Journal of Luminescence

Volumn 128, Issue 10, 2008, Pages 1641-1648

  Choppali, Uma ^a   Gorman, Brian P ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

Author keywords

Photoluminescence; Polymeric precursor process; Spin coating; Thin films; Zinc oxide

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CHELATION; CITRIC ACID; CLADDING (COATING); DECOMPOSITION; EMISSION SPECTROSCOPY; ETHYLENE; ETHYLENE GLYCOL; FULL WIDTH AT HALF MAXIMUM; GLYCOLS; GRAIN GROWTH; GRAVIMETRIC ANALYSIS; LIGHT EMISSION; LUMINESCENCE; METALLIC FILMS; MICROSCOPIC EXAMINATION; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; OPTICAL FILMS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; OXIDE FILMS; OXIDES; PHOTORESISTS; PYROLYSIS; SCANNING PROBE MICROSCOPY; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTING ZINC COMPOUNDS; SOLIDS; SPIN COATING; STABILIZERS (AGENTS); STEEL ANALYSIS; STRUCTURAL PROPERTIES; THERMOGRAVIMETRIC ANALYSIS; THICK FILMS; THIN FILMS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC ALLOYS; ZINC OXIDE; ZINC SULFIDE;

(PL) PROPERTIES; ANNEALED SAMPLES; ANNEALING TEMPERATURE (TA); ATOMIC FORCE MICROSCOPY (AFM); BAND EDGES; C AXIS DIRECTION; CHELATING AGENTS; CITRATE PRECURSORS; CRACK FREE; ELSEVIER (CO); FREE EXCITON (FX); FULL WIDTH AT HALF-MAXIMUM (FWHM); GRAZING INCIDENCE; LONGITUDINAL-OPTICAL (LO); NANO CRYSTALLINE; NANOCRYSTALLINE ZNO; NEAR-BAND-EDGE (NBE); OPTICAL (PET) (OPET); OPTICAL TECHNIQUES; OPTICAL TRANSMISSION SPECTROSCOPY; PHOTOLUMINESCENCE (PL); POLY CRYSTALLINE; POLYMERIC PRECURSORS; PREFERENTIAL ORIENTATION; ROCKING CURVE (RC); ROOM-TEMPERATURE (RT); SPHERICAL MORPHOLOGIES; SPIN COATINGS; TIME-RESOLVED PHOTOLUMINESCENCE (PL) SPECTRA; ULTRAVIOLET (UV) EMISSION; UNIFORMLY DISTRIBUTED; VISIBLE REGIONS; X RAY DIFFRACTION (XRD); XRD ANALYSIS; ZNO FILMS; ZNO THIN FILMS;

X RAY FILMS;

EID: 47549096024     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2008.03.013     Document Type: Article

References (30)

1. Pearton S.J., Norton D.P., Ip K., Heo Y.W., and Steiner T. Prog. Mater. Sci. 50 (2005) 293
2. Loffler J., Groenen R., Linden J.L., van de Sanden M.C.M., and Schropp R.E.I. Thin Solid Films 392 (2001) 315
3. Huang M.H., Mao S., Feick H., Yan H., Wu Y., Kind H., Webber E., Russo R., and Yang P. Science 292 (2001) 1897
4. Ramamoorthy K., Sanjeeviraja C., Jayachandran M., Sankaranarayanan K., Misra P., and Kukreja L. Curr. Appl. Phys. 6 (2006) 103
5. Purica M., Budianu E., Rusu E., Danila M., and Gavrila R. Thin Solid Films 403-404 (2002) 485
6. Yang X., Zhang J., Bi Z., He Y., Xu Q., Hongbo W., Zhang W., and Hou X. J. Cryst. Growth 284 (2005) 123
7. Puchert M.K., Timbrell P.Y., and Lamb R.N. J. Vac. Sci. Technol. A 14 (1996) 2220
8. Yoo J., Lee J., Kim S., Yoon K., Park I.J., Dhungel S., Karunagaran B., Mangalaraj D., and Yi J. Thin Solid Films 480-481 (2005) 213
9. Major S., Banerjee A., and Chopra K.L. Thin Solid Films 125 (1985) 179
10. Bao D., Gu H., and Kuang A. Thin Solid Films 312 (1998) 37
11. Mondelaers D., Vanhoyland G., Van Den Rul H., D'Haen J., Van Bael M.K., Mullens J., and Van Poucke L.C. J. Sol-Gel. Sci. Technol. 26 (2003) 523
12. Luna-Arredondo E., Maldonado A., Asomoza R., Acosta D., Melndez-Lira M., and de la L. Olvera M. Thin Solid Films 490 (2005) 132
13. Xue S.W., Zu X.T., Zhou W.L., Deng H.X., Xiang X., Zhang L., and Deng H. J. Alloys Compd. 448 (2008) 21
14. M.P. Pechini, US Patent No. 3,330,697, July 1967.
15. Xu Y., Yuan X., Huang G., and Long H. Mater. Chem. Phys. 90 (2005) 333
16. Kwon Y.J., Kim K.H., Lim C.S., and Shim K.B. J. Ceram. Process Res. 3 (2002) 146
17. Lima S.A.M., Cremona M., Davolos M.R., Legnani C., and Quirino W.G. Thin Solid Films 516 (2007) 165
18. Agashe C.H., Kluth O., Schöpe G., Siekmann H., Hüpkes J., and Rech B. Thin Solid Films 442 (2003) 167
19. Choppali U., and Gorman B.P. J. Am. Ceram. Soc. 90 (2007) 433
20. Brenier R., and Ortega L. J. Sol-Gel. Sci. Technol. 29 (2004) 137
21. Fujimura N., Nishihara T., Goto S., Xu J., and Ito T. J. Cryst. Growth 130 (1993) 269
22. Wang M., Kim E.J., Chung J.S., Shin E.W., Hahn S.H., Lee K.E., and Park C. Phys. Stat. Sol. (a) 203 (2006) 2418
23. Bentes L., Ayouchi R., Santos C., Schwarz R., Sanguino P., Conde O., Peres M., Monteiro T., and Teodoro O. Superlattices Microstruct. 42 (2007) 152
24. Kock U., Fojtik A., Weller H., and Henglein A. Chem. Phys. Lett. 122 (1985) 507
25. Vanheusden K., Warren W.L., Seager C.H., Tallant D.R., Voigt J.A., and Gnade B.E. J. Appl. Phys. 79 (1996) 7983
26. Lucca D.A., Hamby D.W., Klopfstein M.J., and Cantwell G. Phys. Stat. Sol. (b) 229 (2002) 845
27. U. Choppali, B.P. Gorman, Opt. Mater., 2008, doi:10.1016/j.optmat.2008.02.004.
28. Hamby D.W., Lucca D.A., Klopfstein M.J., and Cantwell G. J. Appl. Phys. 93 (2003) 3214
29. Wischmeier L., Voss T., Börner S., and Schade W. Appl. Phys. A 84 (2006) 111
30. Yang L.R., Jin Z.G., Bu S.J., Sun Y.C., and Cheng Z.J. Rare Met. 23 (2004) 214