Analysis of resin flow during nano-imprinting lithographic process

Current Applied Physics

Volumn 8, Issue 6, 2008, Pages 679-686

  Kang, J H ^a   Kim, S M ^a   Woo, Y S ^a   Lee, W I ^a  

^a Seoul National University   (South Korea)

Author keywords

Multiphase flows; Nanolithography; Nanoscale pattern formation

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; FLUID DYNAMICS; FLUID MECHANICS; IMAGING TECHNIQUES; NANOTECHNOLOGY; NUMERICAL ANALYSIS; NUMERICAL METHODS; RESINS;

ELECTRON MICROSCOPY (TEM AND SEM); EXPERIMENTAL OBSERVATIONS; FILLING PATTERNS; FINITE ELEMENT (FE); FIXED-GRID METHODS; FLOW BEHAVIORS; LITHOGRAPHIC PROCESSING; NANO-IMPRINTING; NUMERICA L RESULTS; POLY METHYL METHACRYLATE (PMMA); PROCESS VARIABLES; RESIN FLOWS;

FINITE ELEMENT METHOD;

EID: 47349105569     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2007.04.058     Document Type: Article

References (10)

1. Chou S.Y., Krauss P.R., Zhang W., Guo L., and Zhuang L. J. Vac. Sci. Technol. B 15 (1997) 2897-2904
2. Chou S.Y., Krauss P.R., and Renstrom P. Science 272 (1996) 85-87
3. Krauss P.R., and Chou S.Y. Appl. Phys. Lett. 71 21 (1997) 3174-3176
4. Scheer H.-C., Schulz H., Hoffman T., and Sotomayor Torres C.M. J. Vac. Sci. Technol. B 16 (1998) 3917
5. Juang L.J., Lee L.J., and Koelling K.W. Polym. Eng. Sci. 42 (2002) 551-566
6. Shen X.J., Pan L.W., and Lin L. Sens. Actuators A 97-98 (2002) 428-433
7. Hirai Y., Fujiwara M., Okuno T., and Tanaka Y. J. Vac. Sci. Technol. B 19 (2001) 1023-1071
8. Jeong J.H., Choi Y.S., Shin T.J., Lee J.J., Park K.T., Lee E.S., and Lee S.R. Fibers Polym. 3 (2002) 113
9. Heyderman L.J., Schift H., David C., Govrecht I., and Schweizer T. Microelectron. Eng. 54 (2000) 229-245
10. Brackbill J.U., Kothe D.B., and Zenmach C. J. Comput. Phys. 100 (1992) 335-354