Electromagnetic force-assisted imprint technology for fabrication of submicron-structure

Microelectronic Engineering

Volumn 85, Issue 7, 2008, Pages 1652-1657

  Hocheng, H ^a   Wen, T T ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Electromagnetic force; Micro and nanostructure; Submicron scale

Indexed keywords

ELECTROMAGNETIC FIELD EFFECTS; ELECTRONIC STRUCTURE; SCANNING ELECTRON MICROSCOPY; SUBSTRATES;

ELECTROMAGNETIC FORCES; SUBMICRON-STRUCTURE;

ELECTROSTATIC PRINTING;

ELECTROMAGNETIC FIELDS; PRINTING; SCANNING ELECTRON MICROSCOPY; STRUCTURES; SUBSTRATES;

EID: 46549083370     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.04.016     Document Type: Article

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