Fabrication of multimode polymeric waveguides by hot embossing lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 A, 2004, Pages 3450-3451

  Yoon, Keun Byoung ^a   Choi, Choon Gi ^a   Han, Sang Pil ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Hot embossing; Optical waveguides; Polymeric multimode waveguide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CLADDING (COATING); ETCHING; GLASS TRANSITION; MONOMERS; OPTICAL COMMUNICATION; OPTICAL INTERCONNECTS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION; WAVE PROPAGATION;

HOT EMBOSSING; ION ETCHING; OPTICAL DEVICE; POLYMERIC MULTIMODE WAVEGUIDES;

OPTICAL WAVEGUIDES;

EID: 4344629389     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3450     Document Type: Article

References (9)

1. L. Eidada, C. Xu, K. M. T. Stengle, L. W. Shacklette and J. T. Yardley: J. Lightwave Technol. 14 (1996) 1704.
2. G. Fischbeck, R. Moosburger, C. Kostrezewa, A. Achen and K. Petermann: Electron. Lett. 33 (1997) 518.
3. U. Streppel, P. Dannberg, C. Wächter, A. Bräuer, L. Fröhlich, R. Houbertz and M. Popall: Opt. Mater. 21 (2002) 475.
4. R. Yoshimura, M. Hikita, S. Tomaru and S. Imamura: Electron. Lett. 33 (1997) 1240.
5. M. Kagami, H. Ito, T. Ichikawa, S. Kato, M. Matsuda and N. Takahashi: Appl. Opt. 34 (1995) 1041.
6. S. Lehmacher and A. Neyer: Electron. Lett. 36 (2000) 1052.
7. C.-G. Choi, S.-P. Han, B. C. Kim, S.-H. Ahn and M.-Y. Jeong: IEEE Photonics Tech. Lett. 15 (2003) 825.
8. M. Heckele, W. Bacher and K. M. Müller: Microsyst. Technol. 4 (1998) 122.
9. S. Park, C. Padeste, H. Schift and J. Gobrecht: Microelectron. Eng. 67-68 (2003) 252.