Effects of hydrogen ambient and film thickness on ZnO:Al properties

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 4, 2008, Pages 692-696

  Duenow, Joel N ^a   Gessert, Timothy A ^b   Wood, David M ^a   Dillon, Anne C ^b   Coutts, Timothy J ^b  

^a Department of Metallurgical and Materials Engineering   (United States)

^b NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

(PL) PROPERTIES; ANNEALING EXPERIMENTS; DOPED FILMS; DOPING LEVELS; IONIZED IMPURITY SCATTERING (IIS); RF MAGNETRON SPUTTERING; SCATTERING MECHANISMS; SPUTTERING AMBIENT; SUBSTRATE TEMPERATURE (ST); TEMPERATURE DEPENDENT HALL MEASUREMENTS; TEMPERATURE PROGRAMMED DESORPTION (TPD); ZNO LATTICE;

ALUMINUM; ANNEALING; ARGON; DESORPTION; FILM THICKNESS; HYDROGEN; MOLECULAR BEAM EPITAXY; OZONE WATER TREATMENT; SCATTERING; SEMICONDUCTING ZINC COMPOUNDS; STRUCTURAL ANALYSIS; TEMPERATURE PROGRAMMED DESORPTION; ZINC ALLOYS; ZINC OXIDE;

MAGNETRON SPUTTERING;

EID: 46449093304     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2891261     Document Type: Article

References (25)

1. B. G. Lewis and D. C. Paine, MRS Bull. 25, 22 (2000).
2. T. J. Coutts, D. L. Young, and X. Li, MRS Bull. 25, 58 (2000).
3. T. Minami, Semicond. Sci. Technol. 20, S35 (2005).
4. B. Szyszka, Thin Solid Films 351, 164 (1999).
5. K. Ellmer, J. Phys. D 34, 3097 (2001).
6. Y. Yoshida, D. M. Wood, T. A. Gessert, and T. J. Coutts, Appl. Phys. Lett. 84, 2097 (2004).
7. J. A. A. Selvan, A. E. Delahoy, S. Guo, and Y.-M. Li, Sol. Energy Mater. Sol. Cells 90, 3371 (2006).
8. G. D. Mahan, J. Appl. Phys. 54, 3825 (1983).
9. E. Ziegler, A. Heinrich, H. Opperman, and G. Stover, Phys. Status Solidi A 66, 635 (1981).
10. A. F. Kohan, G. Ceder, D. Morgan, and C. G. Van de Walle, Phys. Rev. B 61, 15019 (2000).
11. D. C. Look, J. W. Hemsky, and J. R. Sizelove, Phys. Rev. Lett. 82, 2552 (1999).
12. A. Janotti and G. G. Van de Walle, J. Cryst. Growth 287, 58 (2006).
13. C. G. Van de Walle and J. Neugebauer, Nature (London) 423, 626 (2003).
14. C. G. Van de Walle, Phys. Status Solidi B 235, 89 (2003).
15. . Kili̧ and A. Zunger, Appl. Phys. Lett. 81, 73 (2002).
16. A. Janotti and C. G. Van de Walle, Nat. Mater. 6, 44 (2007).
17. C. G. Van de Walle, Phys. Rev. Lett. 85, 1012 (2000).
18. E. V. Lavrov, J. Weber, F. Börrnert, C. G. Van de Walle, and R. Helbig, Phys. Rev. B 66, 165205 (2002).
19. C. A. Wolden, T. M. Barnes, J. B. Baxter, and E. S. Aydil, J. Appl. Phys. 97, 043522 (2005).
20. K. Ip, M. E. Overberg, Y. W. Heo, D. P. Norton, S. J. Pearton, C. E. Stutz, B. Luo, F. Ren, D. C. Look, and J. M. Zavada, Appl. Phys. Lett. 82, 385 (2003).
21. J. N. Duenow, T. A. Gessert, D. M. Wood, T. M. Barnes, M. Young, B. To, and T. J. Coutts, J. Vac. Sci. Technol. A 25, 955 (2007).
22. K. L. Chopra and S. R. Das, Thin Film Solar Cells (Plenum, New York, 1983).
23. Y. Shimizu and M. Egashira, MRS Bull. 24, 18 (1999).
24. S. Limpijumnong and S. B. Zhang, Appl. Phys. Lett. 86, 151910 (2005).
25. P. Sagar, M. Kumar, and R. M. Mehra, Thin Solid Films 489, 94 (2005).