Defect structures in cosputtered thin films of transition-metal disilicides with C11b, C40 and C54 structures

Metallurgical and Materials Transactions A: Physical Metallurgy and Materials Science

Volumn 35 A, Issue 8, 2004, Pages 2229-2238

  Inui, Haruyuki ^a   Hashimoto, Takashi ^a   Fujii, Akihiro ^a   Sakamoto, Hiroki ^a   Okamoto, Norihiko L ^a   Tanaka, Katsushi ^b   Yamaguchi, Masaharu ^a  

^a KYOTO UNIVERSITY   (Japan)

^b KAGAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL DEFECTS; CRYSTAL ORIENTATION; MOLYBDENUM COMPOUNDS; MORPHOLOGY; SPUTTERING; STOICHIOMETRY; TANTALUM COMPOUNDS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; TWINNING;

CRYSTALLITES; DEFECT STRUCTURES; ENANTIOMORPHIC; RACEMIC TWINS; TRANSITION METAL DISILICIDES;

THIN FILMS;

EID: 4644360268     PISSN: 10735623     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11661-006-0202-z     Document Type: Article

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