Defect and electronic structures in TiSi2 thin films produced by co-sputtering. Part 1: Defect analysis by transmission electron microscopy

Acta Materialia

Volumn 49, Issue 1, 2001, Pages 83-92

  Inui, H ^a   Hashimoto, T ^a   Tanaka, K ^a   Tanaka, I ^a   Mizoguchi, T ^a   Adachi, H ^a   Yamaguchi, M ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; CRYSTAL DEFECTS; CRYSTAL LATTICES; ELECTRONIC STRUCTURE; NUCLEATION; PHASE TRANSITIONS; SPUTTERING; THERMAL EFFECTS; THIN FILMS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

COSPUTTERING; TITANIUM DISILICIDE;

SEMICONDUCTING FILMS;

EID: 0035151942     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(00)00296-2     Document Type: Article

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