Structure and chemistry of planar defects in bulk and thin film MoSi2

Journal of Electron Microscopy

Volumn 48, Issue 6, 1999, Pages 689-700

  Inui, Haruyuki ^a   Hashimoto, Takashi ^a   Kazuhiro, Ito ^a   Yamaguchi, Masaharu ^a   Kawasaki, Masahiro ^b  

^a KYOTO UNIVERSITY   (Japan)

^b JEOL LTD   (Japan)

Author keywords

FE TEM; HREM; MoSi2; Stacking fault; Transition metal silicide; Twin

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MOLYBDENUM COMPOUNDS; SILICIDES; STACKING FAULTS; THIN FILMS;

ATOMISTIC STRUCTURE; CHEMICAL COMPOSITIONS; COMPOSITIONAL VARIATION; FE-TEM; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PLANAR DEFECT; THIN-FILMS; TRANSITION METAL SILICIDES; TWIN; TWIN BOUNDARIES;

TRANSITION METALS;

EID: 0033492587     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/oxfordjournals.jmicro.a023737     Document Type: Conference Paper

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