RHEED study of Pd film growth on Al2O3 (111)/NiAl (110)

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 136-140

  Moroz, V ^a,b   Lykhach, Y ^a   Yoshitake, M ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Aluminum oxide; Epitaxy; Palladium; RHEED

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTALLOGRAPHY; ENERGY GAP; EPITAXIAL GROWTH; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; NUCLEATION; OXIDATION; POLYCRYSTALLINE MATERIALS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THICKNESS MEASUREMENT;

BAND GAP; ELECTRON BEAM ENERGY; SURFACE DEFECTS;

PALLADIUM;

EID: 4644303164     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.109     Document Type: Article

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