RHEED study of Pd thin film growth on α-Al2O3 substrate

Vacuum

Volumn 50, Issue 1-2, 1998, Pages 151-155

  Masek K ^a   Matolin V ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CATALYST ACTIVITY; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM PREPARATION; PALLADIUM; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STOICHIOMETRY; SURFACE STRUCTURE; THIN FILMS;

MICRO ELECTRON BEAM EVAPORATION SOURCE; THREE DIMENSIONAL GROWTH MODE;

FILM GROWTH;

EID: 0032058215     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00027-x     Document Type: Article

References (5)

1. Mašek, K., Matolín, V. and Gillet, M., Thin Solid Films, 1995, 260, 252.
2. Matolín, V. and Peuchot, B., Thin Sol. Films, 1995, 259, 65.
3. Howe, J. M., Int. Mat. Rev., 1993, 38, 233.
4. Stará, I., Zeze, D., Matolín, V., Pavluch, J. and Gruzza, B., Appl. Surf. Sci., 1997, 115, 46-52.
5. Mašek, K. and Matolín, V., Thin Solid Films, 1996, 286, 330-335.