Cu adsorption on carboxylic acid-terminated self-assembled monolayers: A high-resolution X-ray photoelectron spectroscopy study

Thin Solid Films

Volumn 464-465, Issue , 2004, Pages 388-392

  Whelan, Caroline M ^a   Ghijsen, Jacques ^b   Pireaux, Jean Jacques ^b   Maex, Karen ^a,c  

^a IMEC   (Belgium)

^b UNIVERSITY OF NAMUR   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Carboxylic acid; Cu adsorption; X ray photoelectron spectroscopy

Indexed keywords

ADSORPTION; BINDING ENERGY; CARBOXYLIC ACIDS; COPPER; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; HYDROCARBONS; LOW ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; THIN FILMS; VACUUM DEPOSITED COATINGS; X RAY PHOTOELECTRON SPECTROSCOPY;

CU ADSORPTION; ELECTRO-MIGRATION ENDURANCE; INTERFACIAL ENGINEERING; PHOTOELECTRON SPECTROMETERS;

SELF ASSEMBLY;

EID: 4644237837     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.06.041     Document Type: Article

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