High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane

Thin Solid Films

Volumn 516, Issue 19, 2008, Pages 6585-6591

  Ohse, Naoyuki ^a   Hamada, Kazu ^a   Saha, Jhantu Kumar ^a   Kobayashi, Tomohiro ^b   Takemura, Yu ichiro ^c   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

c Si:H:Cl; High density plasma; Microwave plasma; SiH2Cl2

Indexed keywords

ANTENNA ACCESSORIES; CARBON NANOTUBES; METALLIZING; MICROCRYSTALLINE SILICON; MICROWAVES; PLASMA (HUMAN); PLASMA DEPOSITION; PLASMA SOURCES; PLASMAS; SILICON; VAPOR DEPOSITION;

(100) SILICON; DICHLOROSILANE (DCS); FAST DEPOSITION; HIGH-DENSITY; HIGH-DENSITY MICROWAVE PLASMAS; MICROWAVE PLASMA SOURCES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 45549083206     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.11.032     Document Type: Article

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