High rate deposition of μc-Si with plasma gun CVD

Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 2, 1996, Pages 935-939

  Imajyo, Nobuhiko ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; ELECTRIC ARCS; EMISSION SPECTROSCOPY; LIGHT EMISSION; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA GUNS; RAMAN SCATTERING; SILANES; TRANSMISSION ELECTRON MICROSCOPY;

DC ARC PLASMA GUN CHEMICAL VAPOR DEPOSITION; GAS PHASE REACTIONS; HIGH RATE DEPOSITION; INFRARED ABSORPTION; MICROCRYSTALLINE SILICON;

AMORPHOUS SILICON;

EID: 0030563274     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(96)00090-7     Document Type: Article

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