Influence of pellicle on hyper-NA imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Sato, Kazuya ^a   Nagai, Satoshi ^a   Shinichiro, Nakagawa ^a   Sato, Takashi ^a   Itoh, Masamitsu ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CD uniformity; High index; Hyper NA; Jones pupil; Pellicle film; Polarization

Indexed keywords

AEROSPACE APPLICATIONS; CADMIUM; CADMIUM COMPOUNDS; CRACK DETECTION; CURVE FITTING; LENSES; LITHOGRAPHY; MICROFLUIDICS; OPTICAL INSTRUMENTS; PHOTOACOUSTIC EFFECT; SODIUM;

(I ,J) CONDITIONS; CD UNIFORMITY (CDU); CD VARIATIONS; HYPER-NA; HYPER-NA IMAGING; LENS MAGNIFICATION; LIGHT INCIDENCE; MULTIPLE REFLECTIONS; NORMAL INCIDENCE; OBLIQUE INCIDENCE; OPTICAL MICRO LITHOGRAPHY; OPTICAL PROXIMITY EFFECT (OPE); ROOT CAUSES; THICKNESS OPTIMIZATION; THROUGH PITCH; TRANSMISSION CHARACTERISTICS; TRANSMISSION VARIATION;

DATA STORAGE EQUIPMENT;

EID: 45449083237     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772612     Document Type: Conference Paper

References (6)

1. K.Bubke et al., "Pellicle-induced aberrations and apodization in hyper-NA optical lithography," Proc. SPIE 6283, 628318 (2006)
2. M.Totzeck et al.,"How to describe polarization influence on imaging?," Proc. SPIE 5754, 23-37(2005)
3. D.G.Flagello et al.,"Challenges with hyper-NA (NA>1.0) polarized light lithography for sub lambda /4 resolution," Proc. SPIE 5754, 53-68(2005)
4. N.Yamamoto et al.,"Polarization aberration analysis using Pauli-Zernike representation," Proc. SPIE 6520, 65200Y (2007)
5. H.Koop et al.," Impact of mask pellicle effects to OPC quality," Proc. SPIE 6607, 66070N (2007)
6. Y.Ohmura et al.,"Current status of high-index immersion lithography development," Proc. SPIE 6520, 652006(2007)