Silver metal organic chemical vapor deposition for advanced silver metallization

Microelectronic Engineering

Volumn 82, Issue 3-4 SPEC. ISS., 2005, Pages 296-300

  Gao, L ^a   Harter P ^a   Linsmeier, Ch ^b   Wiltner, A ^b   Emling, R ^a   Schmitt Landsiedel, D ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

MOCVD; Silver metallization; Silver precursor; Thin film

Indexed keywords

DEPOSITION; ELECTRIC CONDUCTIVITY; POLISHING; VAPORIZATION;

PRECURSOR VAPORIZATION; SILVER DEPOSITION;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 28044438936     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.07.078     Document Type: Conference Paper

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