Characteristic capacitance in an electric force microscope determined by using sample surface bias effect

Journal of Applied Physics

Volumn 103, Issue 11, 2008, Pages

  Qi, G C ^a   Yan, H ^a   Guan, L ^a   Yang, Y L ^a   Qiu, X H ^a   Wang, C ^a   Li, Y B ^b   Jiang, Y P ^c  

^a NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

^b GANNAN NORMAL UNIVERSITY   (China)

^c TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROACUPUNCTURE; INTERFACES (MATERIALS); ISOMERS; MICROSCOPES; SEPARATION; SURFACE CHARGE; SURFACE PROPERTIES; SURFACES;

AMERICAN INSTITUTE OF PHYSICS (AIP); EFFECTIVE CHARGES; ELECTRIC FORCE MICROSCOPE (EFM); ELECTRIC FORCE MICROSCOPY (EFM); FIRST DERIVATIVES; SAMPLE SURFACES;

CAPACITANCE;

EID: 45149133987     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2938846     Document Type: Article

References (16)

1. S. W. Howell and D. B. Janes, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1844615 97, 043703 (2005).
2. B. D. Terris, J. E. Stern, D. Rugar, and H. J. Mamin, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.63.2669 63, 2669 (1989).
3. T. D. Krauss and L. E. Brus, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.83.4840 83, 4840 (1999).
4. O. Cherniavskaya, L. W. Chen, V. Weng, L. Yuditsky, and L. E. Brus, J. Phys. Chem. B JPCBFK 1089-5647 10.1021/jp0265438 107, 1525 (2003).
5. T. Ḿlin, H. Diesinger, D. Deresmes, and D. Stívenard, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.69.035321 69, 035321 (2004).
6. R. Krishnan, M. A. Hahn, Z. Yu, J. Silcox, P. M. Fauchet, and T. Krauss, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.92.216803 92, 216803 (2004).
7. S. Belaidi, P. Girard, and G. Leveque, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.363884 81, 1023 (1997).
8. G. M. Sacha, A. Verdaguer, J. Martinez, J. J. Sáenz, D. F. Ogletree, and M. Salmeron, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1884764 86, 123101 (2005).
9. A. V. Krayev, G. A. Shandryuk, L. N. Grigorov, and R. V. Talroze, Macromol. Chem. Phys. MCHPES 1022-1352 10.1002/macp.200600136 207, 966 (2006).
10. Y. Martin, D. W. Abraham, and H. K. Wickramasinghe, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.99224 52, 1103 (1988).
11. T. Albrecht, P. Grutter, D. Horne, and D. Rugar, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.347347 69, 668 (1991).
12. We take into account the fact that the EFM spatial resolution will dramatically degrade at large tip-sample distance and consequently compromise its application capability. We hereby limited the lift height in the measurement to a moderate range from 500 to 1600 nm. On the other hand, strong nonlinear effects caused by the large electric field in tip-sample gap were observed when the tip is set close to the sample surface, usually occurring at a lift height of a few hundreds of nanometers.
13. A. Alessandrini, G. Valdr̀, B. Morten, and M. Prudenziati, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1506188 92, 4705 (2002).
14. J. Jiang, T. D. Krauss, and L. E. Brus, J. Phys. Chem. B JPCBFK 1089-5647 10.1021/jp001659u 104, 11936 (2000).
15. M. J. Gordon and T. Baron, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.72.165420 72, 165420 (2005).
16. E. Tevaarwerk, D. G. Keppel, P. Rugheimer, M. G. Lagally, and M. A. Eriksson, Rev. Sci. Instrum. RSINAK 0034-6748 10.1063/1.1898183 76, 053707 (2005).