Electric force microscopy investigation of the microstructure of thick film resistors

Journal of Applied Physics

Volumn 92, Issue 8, 2002, Pages 4705-4711

  Alessandrini, A ^a   Valdre G ^b   Morten, B ^a   Prudenziati, M ^a  

^a UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^b INFM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTING PHASIS; CONDUCTIVE GRAINS; ELECTRIC FIELD DISTRIBUTIONS; FIRING CONDITIONS; FIRING TEMPERATURE; GLASSY MATRICES; MICROSCOPIC SCALE; NEW MODEL; PIEZORESISTIVE PROPERTIES; STRUCTURAL CHARACTERISTICS; THICK FILM RESISTORS; X-RAY ENERGY DISPERSIVE SPECTROSCOPY;

CONDUCTIVE FILMS; ELECTRIC FIELDS; ELECTRIC FORCE MICROSCOPY; ENERGY DISPERSIVE SPECTROSCOPY; LEAD; MICROSTRUCTURE; RESISTORS; RUTHENIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; THICK FILMS; X RAY DIFFRACTION;

ELECTRIC PROPERTIES;

EID: 18744395741     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1506188     Document Type: Article

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