Fabrication of polydimethylsiloxane shadow masks for chemical solution deposition of CdS thin-film transistors

Thin Solid Films

Volumn 516, Issue 18, 2008, Pages 6492-6498

  Lee, J H ^a   Yoon, J W ^a   Kim, I G ^a   Oh, J S ^a   Nam, H J ^a   Jung, D Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Atomic force microscopy; Cadmium sulfate; Chemical solution deposition; Scanning electron microscopy; Soft lithography; Surface topography; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; MASKS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING CADMIUM COMPOUNDS; SUBSTRATES; SURFACE TOPOGRAPHY;

CADMIUM SULFATE; CHEMICAL SOLUTION DEPOSITION; LASER-PATTERNED METAL SHADOW MASKS; SOFT LITHOGRAPHY;

THIN FILM TRANSISTORS;

EID: 44649163211     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.02.041     Document Type: Article

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