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Volumn 41, Issue 11, 2008, Pages

Effect of boron implantation on the electrical and photoelectrical properties of e-beam deposited Ag-In-Se thin films

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CRYSTAL DEFECTS; DEPOSITION; DOPING (ADDITIVES); ELECTRON BEAMS; PHOTOCONDUCTIVITY;

EID: 44449116054     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/11/115308     Document Type: Article
Times cited : (6)

References (36)
  • 11
    • 44449107875 scopus 로고    scopus 로고
    • Electrical and photo-electrical properties of Ag-In-Se thin films evaporated by e-beam technique
    • olakolu T and Parlak M 2008 Electrical and photo-electrical properties of Ag-In-Se thin films evaporated by e-beam technique Sol. Energy Mater. Sol. Cells submitted
    • (2008) Sol. Energy Mater. Sol. Cells
    • Olakolu, T.1    Parlak, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.