Microstructural dependence of giant-magnetoresistance in electrodeposited Cu-Co alloys

Journal of Materials Science

Volumn 39, Issue 18, 2004, Pages 5701-5709

  Cohen Hyams, T ^a   Plitzko, J M ^b   Hetherington, C J D ^c   Hutchison, J L ^c   Yahalom, J ^a   Kaplan, W D ^a  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b MAX PLANCK INSTITUTE OF BIOCHEMISTRY   (Germany)

^c UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER COBALT ALLOYS; COPPER MATRIX; HETEROGENEOUS ALLOYS; MAGNETIC GRAINS;

ANNEALING; COBALT; ELECTRIC RESISTANCE; ELECTRODEPOSITION; FERROMAGNETIC MATERIALS; GIANT MAGNETORESISTANCE; GRAIN GROWTH; MAGNETIC VARIABLES MEASUREMENT; MELT SPINNING; MICROSTRUCTURE; PERCOLATION (SOLID STATE); PRECIPITATION (CHEMICAL); THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

COPPER ALLOYS;

EID: 4444329439     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000040079.41985.6b     Document Type: Article

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