Effect of annealing and chemical composition on the giant magnetoresistance of electron beam deposited CoxCU(100-x) (11 ≤ x ≤ 45) granular films

Journal of Magnetism and Magnetic Materials

Volumn 186, Issue 1-2, 1998, Pages 87-96

  Pohorilyi, A N ^a   Kravetz, A F ^a   Shipil, E V ^a   Vovk, A Ya ^a   Kim, Chang Sik ^a   Khan, H R ^b  

^a INSTITUTE OF MAGNETISM   (Ukraine)

^b Depart of Electrochemistry Research Institute for Precious Metals and Metal Chemistry Fem   (Germany)

Author keywords

Annealing effect; Magnetoresistance giant; Thin films granular

Indexed keywords

ANNEALING; COBALT ALLOYS; COMPOSITION EFFECTS; ELECTRON BEAMS; GRANULAR MATERIALS; HIGH TEMPERATURE APPLICATIONS; MAGNETIZATION; MAGNETORESISTANCE; METALLIC FILMS; MORPHOLOGY; SPUTTER DEPOSITION; THIN FILMS;

ELECTRON BEAM EVAPORATION TECHNIQUE;

MAGNETIC FILMS;

EID: 0032123902     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(98)00050-X     Document Type: Article

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