Magnetoresistance effect in Co-Ag and Co-Cu alloy films prepared by electrodeposition

Journal of the Electrochemical Society

Volumn 145, Issue 2, 1998, Pages 565-568

  Zaman, H ^a   Yamada, A ^a   Fukuda, H ^a   Ueda, Y ^a  

^a MURORAN INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COBALT ALLOYS; CURRENT DENSITY; ELECTRODEPOSITION; GRAIN SIZE AND SHAPE; IRON ALLOYS; MAGNETORESISTANCE; PHASE SEPARATION; PRECIPITATION (CHEMICAL); SOLID SOLUTIONS;

MAGNETORESISTANCE RATIO;

METALLIC FILMS;

EID: 0031996582     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838304     Document Type: Article

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