Mapping of ELNES on a nanometre scale by electron spectrospic imaging

Journal of Microscopy

Volumn 183, Issue 1, 1996, Pages 2-8

  Mayer, J ^a   Plitzko, J M ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

amorphous carbon; diamond films; electron spectroscopic imaging (ESI); energy filtering transmission electron microscopy (EFTEM); energy loss near edge structure (ELNES); plasma assisted chemical vapour deposition (PACVD)

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CARBON FILMS; DIAMOND FILMS; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ELECTRONS; ENERGY DISSIPATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; PLASMA CVD;

AMORPHOUS LAYER; DIAMONDS FILMS; ELECTRON SPECTROSCOPIC IMAGING; ENERGY FILTERING TRANSMISSION ELECTRON MICROSCOPY; ENERGY LOSS NEAR EDGE STRUCTURE; ENERGY-FILTERING TRANSMISSION ELECTRON MICROSCOPIES; ENERGY-LOSS NEAR-EDGE STRUCTURE; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION;

AMORPHOUS CARBON;

CARBON;

CHEMICAL STRUCTURE; CONFERENCE PAPER; DIAGNOSTIC IMAGING; ELECTRON MICROSCOPY; IMAGE QUALITY; PRIORITY JOURNAL; SPECTROMETRY; SURFACE PROPERTY;

EID: 0029682631     PISSN: 00222720     EISSN: None     Source Type: Journal    
DOI: 10.1046/j.1365-2818.1996.07370.x     Document Type: Conference Paper

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