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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3984-3985

High-sensitive ultrathin negative electron beam resist based on Langmuir-Blodgett films of polycyanoacrylate

(7) Pisignano, Dario a Berzina, Tatiana b Erokhin, Victor b Fontana, Marco P b Della Torre, Antonio a Visconti, Paolo a Rinaldi, Ross a

a INFM (Italy)

b UNIVERSITY OF PARMA (Italy)

Author keywords

Electron beam lithography; Langmuir Schaefer; Nanostructures; Negative resists; Polyoyanoacrylates

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; LANGMUIR BLODGETT FILMS; MOLECULAR STRUCTURE; MONOLAYERS; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; ULTRATHIN FILMS;

LANGMUIR-SCHAEFER; NANOSTRUCTURES; NEGATIVE RESISTS; POLYCYANOACRYLATES;

POLYACRYLATES;

EID: 4444325732 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.43.3984 Document Type: Conference Paper

Times cited : (1)

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