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Volumn 37, Issue 8, 1998, Pages 4632-4635

Electron-beam study of nanometer performances of the SAL 601 chemically amplified resist

a CNR (Italy)

Author keywords

Chemically amplified resists; Electron beam lithography; Nanostructures

Indexed keywords

CALIBRATION; NANOSTRUCTURED MATERIALS; TESTING;

CHEMICALLY AMPLIFIED RESISTS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032131546 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.37.4632 Document Type: Article

Times cited : (9)

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