Polycyanoacrylate electron beam resists deposited by the Langmuir-Schaefer technique

Thin Solid Films

Volumn 327-329, Issue 1-2, 1998, Pages 659-662

  Troitsky, V I ^a,b   Matveeva, N K ^b  

^a Technobiochip   (Italy)

^b KAPITZA INSTITUTE FOR PHYSICAL PROBLEMS   (Russian Federation)

Author keywords

Cyanoacrylate co polymers; Electron beam lithography; Langmuir Schaefer (LS) technique; Negative resists

Indexed keywords

CHROMIUM; COPOLYMERS; ELECTRON BEAM LITHOGRAPHY; ETCHING; METALLIC FILMS; MONOLAYERS; PLASTIC FILMS; POLYACRYLATES;

LANGMUIR-SCHAEFER TECHNIQUE; POLYCYANOACRYLATE;

PROTECTIVE COATINGS;

EID: 0032139621     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00735-4     Document Type: Article

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