AlInN-based ultraviolet photodiode grown by metal organic chemical vapor deposition

Applied Physics Letters

Volumn 92, Issue 20, 2008, Pages

  Senda, S ^a   Jiang, H ^a   Egawa, T ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; GROWTH RATE; LIGHT EMITTING DIODES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ULTRAVIOLET DEVICES;

DEVICE PERFORMANCE; NITRIDE SEMICONDUCTORS; ULTRAVIOLET PHOTODIODES;

PHOTODIODES;

EID: 44349157025     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2936289     Document Type: Article

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