Photolithography system with liquid crystal display as active gray-tone mask for 3D structuring of photoresist

Sensors and Actuators, A: Physical

Volumn 144, Issue 2, 2008, Pages 381-388

  Hayashi, Terutake ^a   Shibata, Takayuki ^b   Kawashima, Takahiro ^b   Makino, Eiji ^c   Mineta, Takashi ^c   Masuzawa, Toru ^d  

^a OSAKA UNIVERSITY   (Japan)

^b TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^c HIROSAKI UNIVERSITY   (Japan)

^d IBARAKI UNIVERSITY   (Japan)

Author keywords

TAS; Active photomask; Gray tone photolithography; Liquid crystal display; MEMS

Indexed keywords

MASKS; MEMS; PHOTOLITHOGRAPHY; PHOTORESISTORS;

ACTIVE PHOTOMASK; GRAY-TONE PHOTOLITHOGRAPHY;

LIQUID CRYSTAL DISPLAYS;

EID: 43549113121     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2008.02.014     Document Type: Article

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