Improved adhesion of amorphous carbon thin films on glass by plasma treatment

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1297-1300

  Takeda, Satoshi ^a   Suzuki, Susumu ^a  

^a ASAHI GLASS CO LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON THIN FILMS; FILM THICKNESS; GAS PRESSURE; PLASMA TREATMENT;

ADHESION; ARGON; BINDING ENERGY; CARBON; DEPOSITION; GLASS; HYDROGEN; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; OPTIMIZATION; OXYGEN; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 4344714128     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1735867     Document Type: Conference Paper

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