Comparison of edge detection methods using a prototype overlay calibration artifact

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 515-529

  Silver, R M ^a   Jun, J ^a   Kornegay, E ^a   Morton, R ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; CHARGE COUPLED DEVICES; DATA ACQUISITION; LEAST SQUARES APPROXIMATIONS; SILICON WAFERS;

PROTOTYPE OVERLAY CALIBRATION ARTIFACTS;

EDGE DETECTION;

EID: 0034758426     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436777     Document Type: Article

References (11)

1. Accuracy of overlay measurements: Tool and mark asymmetry effects
2. Optical overlay metrology at NIST
3. A method to characterize tool misalignments and Distortions
4. Overlay measurements and edge detection methods
5. Linewidth edge detection algorithm for coherent image profiles
6. Robust subpixel alignment in lithography
7. High accuracy overlay measurements
8. Characterization of imaging optics and CCD cameras for metrology applications
9. Focus algorithms and edge detection methods
10. Tool and mark design factors that influence optical overlay measurement errors