Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 384-390

  Ackmann, Paul W ^a   Brown, Stuart E ^a   Edwards, Richard ^a   Downey, Doug ^a   Michael, Mark ^a   Turnquest, Karen ^a   Nistler, John L ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN; ETCHING; FABRICATION; OPTIMIZATION; PERFORMANCE; PHOTOLITHOGRAPHY; TRANSISTORS;

CRITICAL DIMENSIONS; OPTICAL MICROLITHOGRAPHY;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031333743     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275998     Document Type: Conference Paper

References (0)