Control of spatial and transient temperature trajectories for photoresist processing

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 5, 1999, Pages 2109-2114

  Schaper, Charles D ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 24644524731     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. C. Mack, D. Dewitt, B. Tsai, and G. Yetter, Proc. SPIE 2195, 584 (1994).
2. S. Holmes and J. Sturtevant, Microlithography World 3, 17 (1993).