Optical and thermal properties of Si-O-C films grown by organic catalytic chemical vapor deposition using organic silicon

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 A, 2004, Pages 3530-3534

  Yagi, Tetsuya ^a,b   Nakayama, Hiroshi ^a   Miura, Yozo ^a   Shimoyama, Norio ^c   Machida, Eimei ^c  

^a Osaka Prefecture University   (Japan)

^b MITSUBISHI ELECTRIC CORPORATION   (Japan)

^c TRI Chemical Laboratory Inc   (Japan)

Author keywords

Cat CVD; Organic; Refractive index; Si O C; Stress; Thermal conductivity

Indexed keywords

ALUMINA; CATALYSIS; ELECTRON BEAMS; ELECTRONS; EVAPORATION; FILM GROWTH; MECHANICAL PROPERTIES; OPTICAL COATINGS; OPTICAL PROPERTIES; PLASTIC PRODUCTS; REFRACTIVE INDEX; SILICON; THERMAL CONDUCTIVITY; THERMAL STRESS;

CAT-CVD; OPTICAL APPLICATIONS; SI-O-C; TERNARY ALLOYS;

CHEMICAL VAPOR DEPOSITION;

EID: 4344662951     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3530     Document Type: Article

References (18)

1. H. Matsumura: Jpn. J. Appl. Phys. 37 (1998) 3175.
2. R. Hattori, G. Nakamura, S. Nomura, T. Ichise, A. Masuda and H. Matsumura: Tech. Dig. 19th IEEE GaAs IC Symp., Anaheim, 1997, p. 78.
3. S. Okada and H. Matsumura: Jpn. J. Appl. Phys. 36 (1997) 7035.
4. H. Nakayama, H. Ohta and E. Kulatov: Physica B 302 (2001) 419.
5. H. Nakayama, H. Ohta and E. Kulatov: Thin Solid Films 395 (2001) 234.
6. H. Nakayama, K. Takatsuji, K. Murakami, Y. Miura, N. Shimoyama and H. Machida: Thin Solid Films 430 (2003) 87.
7. K. Takatsuji, M. Kawakami, Y. Makita, K. Murakami, H. Nakayama, Y. Miura, N. Shimoyama and H. Machida: Thin Solid Films 430 (2003) 116.
8. S. Yamamura, K. Shigihara, K. Kawasaki, T. Yagi, Y. Mitsui, S. Zaizen, A. Sugitatsu and T. Hatta: Tech. Dig. OFC2003, Atlanta, Vol. 1, 2003, p. 397.
9. T. Durhuns, B. Mickkelsen, C. Joergensen, S. L. Danielsen and K. E. Stubjaer: IEEE J. Lightwave Technol. 14 (1996) 942.
10. S. Ogura: private communication.
11. H. Nishiguchi and T. Yagi: in preparation for publication.
12. C. H. Henry, P. M. Petroff, R. A. Logan and I. Hayashi: J. Appl. Phys. 50 (1979) 3721.
13. D. G. Cahill, M. Katiyar and J. R. Abelson: Phys. Rev. B 50 (1994) 6077.
14. D. G. Cahill and T. H. Allen: Appl. Phys. Lett. 65 (1994) 309.
15. K. Tanaka, I. Kidoguchi and H. Adachi: Japan Unexamined Patent 97-326531 (1997).
16. G. A. Slack, R. A. Tanzilli, R. O. Pohl and J. W. Vandersande: J. Phys. Chem. Solids 48 (1987) 641.
17. A. R. Goñi, K. Strössner, K. Syassen and M. Gardona: Phys. Rev. B 36 (1987) 1581.
18. E. Martin, J. P. Landesman, J. P. Hirtz and A. Fily: Appl. Phys. Lett. 75 (1999) 2521.