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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1215-1218

Nanosecond surface interferometry measurements on designed and commercial polymers

(3) Hauer, M a Lippert, T a Wokaun, A a

a PAUL SCHERRER INSTITUTE (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

INTERFEROMETRY; MICROSTRUCTURE; MORPHOLOGY; PHOTOCHEMICAL REACTIONS; PLASTIC FILMS; POLYMETHYL METHACRYLATES; SURFACE CHEMISTRY; SURFACE TREATMENT;

ABLATION THRESHOLDS; CHLOROBENZENE; PERMANENT SURFACE MODIFICATION; SURFACE INTERFEROMETRY;

LASER ABLATION;

EID: 4344622525 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-2721-z Document Type: Conference Paper

Times cited : (4)

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