Novel laser ablation resists for excimer laser ablation lithography. Influence of photochemical properties on ablation

Journal of Physical Chemistry B

Volumn 105, Issue 6, 2001, Pages 1267-1275

  Wei, J ^a   Hoogen, N ^a   Lippert, T ^a   Nuyken, O ^b   Wokaun, A ^b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; DECOMPOSITION; EXCIMER LASERS; LIGHT ABSORPTION; OPTICAL PROPERTIES; PHOTOCHEMICAL REACTIONS; PHOTOLITHOGRAPHY; POLYESTERS; POLYIMIDES; POLYOLEFINS; REACTION KINETICS; THERMODYNAMIC PROPERTIES;

FLUENCES; LASER ABLATION RESISTS; PHOTOCHEMICAL DECOMPOSITION; PHOTOCHEMICAL PROPERTIES; TRIAZENE;

LASER ABLATION;

EID: 0035250631     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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