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Volumn 118, Issue 6, 1996, Pages 1551-1552

Direct observation of a photoinduced Wolff rearrangement in PMMA using ultrafast infrared spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; INFRARED SPECTROSCOPY; MOLECULAR STRUCTURE; ORGANIC ACIDS; PHOTOCHEMICAL REACTIONS;

EID: 13344270366     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja9536429     Document Type: Article
Times cited : (36)

References (46)
  • 1
    • 0011867310 scopus 로고
    • Materials for Microlithography
    • Thompson, L. F., Willson, C. G., Frechet, J. M. J., Eds.; American Chemical Society: Washington, DC
    • (a) Bowden, M. J. Materials for Microlithography; Thompson, L. F., Willson, C. G., Frechet, J. M. J., Eds.; ACS Symposium Series 266; American Chemical Society: Washington, DC, 1984; 39.
    • (1984) ACS Symposium Series 266 , pp. 39
    • Bowden, M.J.1
  • 7
    • 0001587386 scopus 로고
    • See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
    • (1993) Angew. Makromol. Chem. , vol.213 , pp. 127
    • Lippert, T.1    Stebani, J.2    Ihlemann, J.3    Nuyken, O.4    Wokaun, A.5
  • 8
    • 0025534999 scopus 로고
    • See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
    • (1990) Appl. Surf. Sci. , vol.46 , pp. 342
    • Hiraoka, H.1    Lazare, S.2
  • 9
    • 0001238143 scopus 로고
    • See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
    • (1993) J. Phys. Chem. , vol.97 , pp. 13761
    • Fukumura, H.1    Mibuka, S.2    Eura, S.3    Masuhara, H.4    Nishi, N.5
  • 10
    • 0023999481 scopus 로고
    • See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
    • (1988) Appl. Phys. , vol.A45 , pp. 289
    • Srinivasan, R.1    Braren, B.2
  • 11
    • 0001476945 scopus 로고
    • See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
    • (1992) Appl. Phys. , vol.B54 , pp. 227
    • Davis, C.R.1    Egitto, F.D.2    Buchwalter, S.L.3
  • 12
    • 36749120859 scopus 로고
    • See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
    • (1982) Appl. Phys. Lett. , vol.40 , pp. 374
    • Kawamura, Y.1    Toyoda, K.2    Namba, S.3
  • 13
    • 0003678786 scopus 로고
    • John Wiley & Sons: New York
    • Widely used in this regard are a variety of diazonaphthoquinones in Novalak resins, including the commercially available naphthoquinone diazides (Shipley-AZ1350J, Kodak-Photoresist 820, Hunt-HPR 204). See: Rabek, J. F. Mechanism of Photophysical Processes and Photochemical Reactions in Polymers; John Wiley & Sons: New York, 1987; p 446.
    • (1987) Mechanism of Photophysical Processes and Photochemical Reactions in Polymers , pp. 446
    • Rabek, J.F.1
  • 14
    • 0000251327 scopus 로고
    • Wolff rearrangements are widely used for various synthetic applications. See, for example: (a) Redmore, D.; Gutsche, C. D. Adv. Alicyclic Chem. 1971, 3, 125. (b) March, J. Advanced Organic Chemistry; McGraw-Hill: New York, 1985; p 974.
    • (1971) Adv. Alicyclic Chem. , vol.3 , pp. 125
    • Redmore, D.1    Gutsche, C.D.2
  • 15
    • 3743065708 scopus 로고
    • McGraw-Hill: New York
    • Wolff rearrangements are widely used for various synthetic applications. See, for example: (a) Redmore, D.; Gutsche, C. D. Adv. Alicyclic Chem. 1971, 3, 125. (b) March, J. Advanced Organic Chemistry; McGraw-Hill: New York, 1985; p 974.
    • (1985) Advanced Organic Chemistry , pp. 974
    • March, J.1
  • 29
    • 13344287850 scopus 로고    scopus 로고
    • Reference 6c
    • (a) Reference 6c.
  • 35
    • 13344251352 scopus 로고    scopus 로고
    • note
    • Commercial photoresists typically use Novolak resin as the polymer matrix. Here, we have choosen PMMA to avoid having the matrix absorb some of the UV excitation pulse. Later studies will examine the effect of different matrices.
  • 38
    • 13344257420 scopus 로고    scopus 로고
    • note
    • A typical film was prepared by dissolving 750 mg of PMMA and 200 mg of DM in 15 mL of THF. This was coated onto a polypropylene sheet (0.5-1.0 mm thick) with a #20 Mayer rod (wet thickness ≈ 50 μm). These were dried in air and stored in the dark. Monitoring the films with UV-vis and IR spectroscopy showed no decomposition over 2 weeks.
  • 41
    • 13344254955 scopus 로고    scopus 로고
    • note
    • -1) in the spectrum of the residual ground state DM molecules.
  • 42
    • 13344266150 scopus 로고    scopus 로고
    • note
    • This agrees with the previously reported values of 0.6 and 1.0: refs 9 and 13.
  • 46
    • 13344273342 scopus 로고    scopus 로고
    • Reference 12d
    • (c) Reference 12d.


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