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See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
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See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
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See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
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Masuhara, H.4
Nishi, N.5
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See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
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Srinivasan, R.1
Braren, B.2
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See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
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Davis, C.R.1
Egitto, F.D.2
Buchwalter, S.L.3
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See, for example: (a) Lippert, T.; Stebani, J.; Ihlemann, J.; Nuyken, O.; Wokaun, A. Angew. Makromol. Chem. 1993, 213, 127. (b) Hiraoka, H.; Lazare, S. Appl. Surf. Sci. 1990, 46, 342. (c) Fukumura, H.; Mibuka, S.; Eura, S.; Masuhara, H.; Nishi, N. J. Phys. Chem. 1993, 97, 13761. (d) Srinivasan, R.; Braren, B. Appl. Phys. 1988, A45, 289. (e) Davis, C. R.; Egitto, F. D.; Buchwalter, S. L. Appl. Phys. 1992, B54, 227. (f) Kawamura, Y.; Toyoda, K.; Namba, S. Appl. Phys. Lett. 1982, 40, 374.
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Kawamura, Y.1
Toyoda, K.2
Namba, S.3
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13
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John Wiley & Sons: New York
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Widely used in this regard are a variety of diazonaphthoquinones in Novalak resins, including the commercially available naphthoquinone diazides (Shipley-AZ1350J, Kodak-Photoresist 820, Hunt-HPR 204). See: Rabek, J. F. Mechanism of Photophysical Processes and Photochemical Reactions in Polymers; John Wiley & Sons: New York, 1987; p 446.
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Rabek, J.F.1
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14
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Wolff rearrangements are widely used for various synthetic applications. See, for example: (a) Redmore, D.; Gutsche, C. D. Adv. Alicyclic Chem. 1971, 3, 125. (b) March, J. Advanced Organic Chemistry; McGraw-Hill: New York, 1985; p 974.
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Gutsche, C.D.2
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15
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3743065708
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McGraw-Hill: New York
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Wolff rearrangements are widely used for various synthetic applications. See, for example: (a) Redmore, D.; Gutsche, C. D. Adv. Alicyclic Chem. 1971, 3, 125. (b) March, J. Advanced Organic Chemistry; McGraw-Hill: New York, 1985; p 974.
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March, J.1
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13344287850
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Reference 6c
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(a) Reference 6c.
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31
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(c) Bouma, W. J.; Nobes, R. H.; Radom, L.; Woodward, C. E. J. Org. Chem. 1982, 47, 1869.
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35
-
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13344251352
-
-
note
-
Commercial photoresists typically use Novolak resin as the polymer matrix. Here, we have choosen PMMA to avoid having the matrix absorb some of the UV excitation pulse. Later studies will examine the effect of different matrices.
-
-
-
-
36
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0001627904
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37
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(b) Stoutland, P. O.; Dyer, R. B.: Woodruff, W. H. Science 1992, 257, 1913.
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Stoutland, P.O.1
Dyer, R.B.2
Woodruff, W.H.3
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38
-
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13344257420
-
-
note
-
A typical film was prepared by dissolving 750 mg of PMMA and 200 mg of DM in 15 mL of THF. This was coated onto a polypropylene sheet (0.5-1.0 mm thick) with a #20 Mayer rod (wet thickness ≈ 50 μm). These were dried in air and stored in the dark. Monitoring the films with UV-vis and IR spectroscopy showed no decomposition over 2 weeks.
-
-
-
-
41
-
-
13344254955
-
-
note
-
-1) in the spectrum of the residual ground state DM molecules.
-
-
-
-
42
-
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13344266150
-
-
note
-
This agrees with the previously reported values of 0.6 and 1.0: refs 9 and 13.
-
-
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43
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0000903526
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Wang. J.-L.; Toscano, J. P.; Platz, M. S.; Nikolaev, V.; Popik, V. J. Am. Chem. Soc. 1995, 117, 5477.
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Wang, J.-L.1
Toscano, J.P.2
Platz, M.S.3
Nikolaev, V.4
Popik, V.5
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46
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13344273342
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Reference 12d
-
(c) Reference 12d.
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