Electric field effect in pulsed laser deposition of epitaxial ZnO thin film

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 807-809

  Hirose, C ^a   Matsumoto, Y ^a   Yamamoto, Y ^b   Koinuma, H ^a,b,c  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; EPITAXIAL GROWTH; OPTIMIZATION; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; TRANSISTORS; ULTRAVIOLET RADIATION; ZINC OXIDE;

CATALYTIC REACTIVITY; LATTICE CONTROL; METAL WIRE; TRANSPARENT TRANSISTORS;

THIN FILMS;

EID: 4344620645     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2568-3     Document Type: Conference Paper

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