Concurrent x-ray diffractometer for high throughput structural diagnosis of epitaxial thin films

Applied Physics Letters

Volumn 79, Issue 22, 2001, Pages 3594-3596

  Ohtani, M ^a   Fukumura, T ^b   Kawasaki, M ^b   Omote, K ^c   Kikuchi, T ^c   Harada, J ^c   Ohtomo, A ^a   Lippmaa, M ^a   Ohnishi, T ^a   Komiyama, D ^a   Takahashi, R ^a   Matsumoto, Y ^a   Koinuma, H ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c RIGAKU CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035956156     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1415402     Document Type: Article

References (9)

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7. The fabrication procedure of the sample is described in: T. Ohnishi, D. Komiyama, T. Koida, S. Ohashi, A. Ohtomo, M. Lippmma, N. Nakagawa, C. Stauter, T. Kikuchi, K. Omote, M. Kawasaki, and H. Koinuma, Appl. Phys. Lett. 79, 536 (2001).
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