Real time optical characterization of gas flow dynamics in high-pressure chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1596-1599

  Woods, Vincent ^a   Born, Harald ^a   Strassburg, Martin ^a   Dietz, Nikolaus ^a  

^a GEORGIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW CHANNELS; GAS FLOW DYNAMICS; OPTICAL CHARACTERIZATION;

ENTHALPY; FILM GROWTH; FLOW MEASUREMENT; HIGH PRESSURE EFFECTS; LAMINAR FLOW; LIGHT SCATTERING; MOLECULAR BEAM EPITAXY; NUCLEATION; PYROLYSIS; REAL TIME SYSTEMS; SEMICONDUCTOR GROWTH; SEMICONDUCTOR MATERIALS; TURBULENCE; TURBULENT FLOW;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 4344606236     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1705589     Document Type: Conference Paper

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