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Surface and Coatings Technology

Volumn 158-159, Issue , 2002, Pages 87-93

Dynamic-sasamal: Simulation software for high-dose ion implantation

(4) Miyagawa, Y a Nakadate, H b Djurabekova, F c Miyagawa, S a

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b CRC Solutions Inc (Japan)

c NATIONAL UNIVERSITY OF UZBEKISTAN (Uzbekistan)

Author keywords

Computer code; Dynamic Monte Carlo simulation; High dose ion implantation

Indexed keywords

AMORPHOUS MATERIALS; COMPUTER SIMULATION; DERIVATIVES; ION IMPLANTATION; SPUTTERING;

BINARY COLLISION MODEL;

COATING TECHNIQUES;

COMPUTER SIMULATOR;

EID: 4344583495 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00225-6 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.