Atomic hydrogen effects on the optical and electrical properties of transparent conducting oxides for a-Si:H TFT-LCDs

Materials Research Society Symposium - Proceedings

Volumn 424, Issue , 1996, Pages 347-354

  Lan, Je Hsiung ^a   Kanicki, Jerzy ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; ATOMS; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; HYDROGEN; LIQUID CRYSTAL DISPLAYS; OPACITY; SEMICONDUCTING INDIUM COMPOUNDS; THIN FILM TRANSISTORS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

ALUMINUM DOPED ZINC OXIDE (AZO) FILMS; ATOMIC HYDROGEN TREATMENT; HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD) TECHNIQUES; INDIUM TIN OXIDES (ITO); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SURFACE WHITENING; TRANSPARENT CONDUCTING OXIDES (TCO);

SEMICONDUCTING FILMS;

EID: 0030398488     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-424-347     Document Type: Conference Paper

References (7)