The challenges of transitioning from linear to high-order overlay control in advanced lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6827, Issue , 2008, Pages

  Adel, M ^a   Izikson, P ^a   Tien, D ^a   Huang, C K ^a   Robinson, J C ^a   Eichelberger, B ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

High order modeling; Overlay metrology; Scanner

Indexed keywords

OPTIMIZATION; POLYNOMIALS; REFLECTION; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS;

HIGH ORDER MODELING; OVERLAY METROLOGY; RETICLE STAGES;

LITHOGRAPHY;

EID: 43249120359     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.778457     Document Type: Conference Paper

References (8)

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