메뉴 건너뛰기




Volumn 6518, Issue PART 1, 2007, Pages

Improved overlay control through automated high order compensation

Author keywords

GCM (Grid Compensation for Matching); Mix and match; Overlay; Scanner; SDM (Super Distortion Matching); SMM (Scanner Match Maker)

Indexed keywords

ERROR ANALYSIS; LIGHTING; PROCESS CONTROL; SCANNING; SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 35148893594     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712710     Document Type: Conference Paper
Times cited : (24)

References (7)
  • 1
    • 33745590110 scopus 로고    scopus 로고
    • Improving Scanner Productivity and Control through Innovative Connectivity Application
    • Metrology, Inspection, and Process Control for Microlithography XX
    • Yuuki Ishii et. al. "Improving Scanner Productivity and Control through Innovative Connectivity Application". Proc. Of SPIE Vol. 6152, 615247, Metrology, Inspection, and Process Control for Microlithography XX
    • Proc. Of SPIE , vol.6152 , pp. 615247
    • Ishii, Y.1    et., al.2
  • 3
    • 33745626747 scopus 로고    scopus 로고
    • Dongsub Choi et. al. Overlay Improvement by Non-linear Error Correction and Non-linear Error Control by APC, Proc. SPIE 6152, 61523W, Metrology, Inspection, and Process Control for Microlithography XX
    • Dongsub Choi et. al. "Overlay Improvement by Non-linear Error Correction and Non-linear Error Control by APC", Proc. SPIE Vol. 6152, 61523W, Metrology, Inspection, and Process Control for Microlithography XX
  • 4
    • 33745624249 scopus 로고    scopus 로고
    • Ayako Sukegawa et. al. Overlay improvement by using new framework of grid compensation for matching, Proc. SPIE 6152, 61523A, Metrology, Inspection, and Process Control for Microlithography XX
    • Ayako Sukegawa et. al. "Overlay improvement by using new framework of grid compensation for matching", Proc. SPIE Vol. 6152, 61523A, Metrology, Inspection, and Process Control for Microlithography XX
  • 5
    • 2942661932 scopus 로고    scopus 로고
    • Takuya Kono et. al. Mix and match overlay method by compensating dynamic scan distortion error, Proc. SPIE 5378, p.221-227, Data Analysis and Modeling for Process Control
    • Takuya Kono et. al. "Mix and match overlay method by compensating dynamic scan distortion error", Proc. SPIE Vol. 5378, p.221-227, Data Analysis and Modeling for Process Control
  • 6
    • 4344678636 scopus 로고    scopus 로고
    • Stephen DeMoor et. al. Scanner Overlay Mix and Match Matrix Generation; Capturing all Sources of Variation, Proc. SPIE 5375, p.66-77, Metrology, Inspection, and Process Control for Microlithography XVIII
    • Stephen DeMoor et. al. "Scanner Overlay Mix and Match Matrix Generation; Capturing all Sources of Variation", Proc. SPIE Vol. 5375, p.66-77, Metrology, Inspection, and Process Control for Microlithography XVIII
  • 7
    • 35148889774 scopus 로고    scopus 로고
    • Proc. SPIE Metrology, Inspection, and Process Control for Microlithography XXA
    • Bernd Schulz et. al. "In-chip overlay metrology in 90nm production" Proc. SPIE Vol. 6152, 615213, Metrology, Inspection, and Process Control for Microlithography XXA.
    • In-chip overlay metrology in 90nm production , vol.6152 , pp. 615213
    • Schulz, B.1    et., al.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.